$220.00 - $430.00
Min. Order : 10 Kilograms

Low price film uniformity minimum particle generation Tungsten Silicide Target for semiconductor

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Quick Details

Port: Xiamen
Payment Terms: L/C,T/T
Supply Ability: 200 Kilogram/Kilograms per Month
Usage: semiconductor and photovoltaic cells industry
Shape: Sheet,Plate,Disk,etc.
Place of Origin: Fujian China
Purity: 99.9%~99.999%
Material: Tungsten Silicide
Chemical Composition: Tungsten Silicide
Model Number: Tungsten Target
Density: 99
Ra: ≤1.6
Brand Name: HL
Grain Size: ≤21
Product name: Tungsten Titanium Target for semiconductor
Dimension (mm): ≤D452
Relative Density (%): ≥99
Application: semiconductor and photovoltaic cells industry
Packaging Detail: Metal box or environmental-friendly carton box
Xiamen Honglu Tungsten Molybdenum Industry Co., Ltd.
Supplier
CN
Manufacturer, Trading Company
85.7%
Response Rate
66.7%
On-time delivery rate
US$ 2,000+
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Transactions
1000+
Employees
50+
R&D staffs
0
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Low Price High Heat-Capacity 99.95% Tungsten Target 

Product Description

Low Price High Heat-Capacity 99.95% Tungsten Target

 

Low price film uniformity minimum particle generation  Tungsten Titanium Target for semiconductor  

WSi films are known to act as the ohmic contact layer at gate electrode in semiconductor application, especially in dynamic random access memory (DRAM) manufacturing, which are deposited by physical vapor deposition (PVD) through sputtering of a tungsten silicide target. Tungsten silicide targets used in semiconductor application have extremely requirements in purity, microstructure control and the quality consistency of target components, which play a crucial role in the performance of thin films. Tungsten silicide targets prepared by HONGLU have the advantages of ultra-high purity (5N), good densification (>99%), uniform microstructure and fine grains.

Spraying blackened tungsten-based targets

 

Type

W

(wt.%)

Si

(wt.%)

Purity

 (wt.%)

Relative Density

 (%)

GrainSize (µm)

Dimension

(mm)

Ra

  (µm)

WSi2.7

70.8

29.2

99.999

≥99

≤15

≤Ø452

 ≤1.6

WSi

70-90

10-30

99.9-99.995

≥99

≤15

≤Ø452

   ≤1.6


target05

 

 

Application Area

Production Process

Low Price High Heat-Capacity 99.95% Tungsten TargetLow Price High Heat-Capacity 99.95% Tungsten Target 

Company Profile

Low Price High Heat-Capacity 99.95% Tungsten Target 

FAQ

 

Low Price High Heat-Capacity 99.95% Tungsten Target

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Low Price High Heat-Capacity 99.95% Tungsten Target